Xuan Luo

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Speaker, Author, Co-Author

Fri. Mar 17, 2017 9:00 AM - 12:45 PM E206 (E206)

Oral presentation
| 13 Semiconductors
| 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

[17a-E206-1~14] 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

9:45 AM - 10:00 AM

▲ [17a-E206-4] Schottky diode characteristics at metal/surface-damaged Ge

〇(M1)Xuan Luo¹, Tomonori Nishimura¹, Takeaki Yajima¹, Akira Toriumi¹ (1.The Univ. of Tokyo)