Naoya Okada

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Speaker, Author, Co-Author

Fri. Mar 17, 2017 9:00 AM - 12:45 PM E206 (E206)

Oral presentation
| 13 Semiconductors
| 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

[17a-E206-1~14] 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

10:15 AM - 10:30 AM

[17a-E206-6] Control of Schottky barrier heights in W/Si junctions by inserting W-silicide films composed of W-encapsulating Si clusters

〇Naoya Okada^1,2, Noriyuki Uchida¹, Toshihiko Kanayama¹ (1.AIST, 2.JST-PRESTO)