ryo yokogawa

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Speaker, Author, Co-Author

Fri. Mar 17, 2017 1:45 PM - 3:30 PM E206 (E206)

Oral presentation
| 13 Semiconductors
| 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

[17p-E206-1~7] 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

2:00 PM - 2:15 PM

△ [17p-E206-2] Evaluation of Anisotropic Biaxial Strains in the Si Nanowire Covered with Oxide Film
by Water-immersion Raman Spectroscopy

〇ryo yokogawa¹, Takahiro Suzuki¹, Shuichiro Hashimoto², Shuhei Asada², Motohiro Tomita^2,3, Takanobu Watanabe², Atsushi Ogura¹ (1.Meiji Univ., 2.Waseda Univ., 3.JSPS Research Fellow)