[17p-E206-1~7] 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

△ [17p-E206-2] Evaluation of Anisotropic Biaxial Strains in the Si Nanowire Covered with Oxide Film
by Water-immersion Raman Spectroscopy

〇ryo yokogawa¹, Takahiro Suzuki¹, Shuichiro Hashimoto², Shuhei Asada², Motohiro Tomita^2,3, Takanobu Watanabe², Atsushi Ogura¹ (1.Meiji Univ., 2.Waseda Univ., 3.JSPS Research Fellow)

Keywords:Si nanowire, Raman spectroscopy