Poster presentation

16 Amorphous and Microcrystalline Materials » 16.1 Fundamental properties, evaluation, process and devices in disordered materials

[15a-P10-1~5] 16.1 Fundamental properties, evaluation, process and devices in disordered materials

Wed. Mar 15, 2017 9:30 AM - 11:30 AM P10 (BP)

△：Presentation by Applicant for JSAP Young Scientists Presentation Award
▲：English Presentation
▼：Both of Above
No Mark：None of Above

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9:30 AM - 11:30 AM

[15a-P10-1] Influence of H₂O on the devitrification of silica glass (II)

〇Naohiro Horii¹, Kurita Momono¹, Aliah Bahardin¹, Sato Naoya², Kuzuu Nobu², Horikoshi Hideharu³, Masahiro Ikeda⁴, Masaru Aniya⁵, Yoshihiro Aoyama¹ (1.Natl. Inst. Tech. Fukui Coll., 2.Univ. of Fukui, 3.Tosoh SGM, 4.Natl. Inst. Tech. Oita Coll., 5.Kumamoto Univ.)

9:30 AM - 11:30 AM

[15a-P10-2] Dependence of diffusion coefficient on OH groups concentration in silica glass

〇(M2)Naoya Sato¹, Yu Arakawa¹, Nobu Kuzuu¹, Hideharu Horikoshi², Hiroki Sakakibara¹ (1.Univ. Fukui, 2.Tosoh SGM)

9:30 AM - 11:30 AM

[15a-P10-3] Charactaristics change on X-ray-induced absorption in various silica glasses

〇(M1)Hiroki Sakakibara¹, Nobu Kuzuu¹, Naoya Sato¹, Yu Arakawa¹, Hideharu Horikoshi² (1.Fukui Univ., 2.Tosoh SGM.)

9:30 AM - 11:30 AM

[15a-P10-4] Effect of SiN_x anti-reflection films and irradiation directions on the structure of poly-Si films in the formation of poly-Si films by FLA

〇(M2)Yuki Sonoda¹, Keisuke Ohdaira¹ (1.JAIST)

9:30 AM - 11:30 AM

[15a-P10-5] Ignition control of the crystallization of a-Si films by flash lamp annealing

〇(M1)Daiki Sato¹, Keisuke Ohdaira¹ (1.JAIST)

Session information

[15a-P10-1~5] 16.1 Fundamental properties, evaluation, process and devices in disordered materials

[15a-P10-1] Influence of H₂O on the devitrification of silica glass (II)

[15a-P10-2] Dependence of diffusion coefficient on OH groups concentration in silica glass

[15a-P10-3] Charactaristics change on X-ray-induced absorption in various silica glasses

[15a-P10-4] Effect of SiN_x anti-reflection films and irradiation directions on the structure of poly-Si films in the formation of poly-Si films by FLA

[15a-P10-5] Ignition control of the crystallization of a-Si films by flash lamp annealing

Authentication

Session information

[15a-P10-1~5] 16.1 Fundamental properties, evaluation, process and devices in disordered materials

[15a-P10-1] Influence of H2O on the devitrification of silica glass (II)

[15a-P10-2] Dependence of diffusion coefficient on OH groups concentration in silica glass

[15a-P10-3] Charactaristics change on X-ray-induced absorption in various silica glasses

[15a-P10-4] Effect of SiNx anti-reflection films and irradiation directions on the structure of poly-Si films in the formation of poly-Si films by FLA

[15a-P10-5] Ignition control of the crystallization of a-Si films by flash lamp annealing

Authentication

[15a-P10-1] Influence of H₂O on the devitrification of silica glass (II)

[15a-P10-4] Effect of SiN_x anti-reflection films and irradiation directions on the structure of poly-Si films in the formation of poly-Si films by FLA