Oral presentation

6 Thin Films and Surfaces » 6.4 Thin films and New materials

[15p-311-1~18] 6.4 Thin films and New materials

Wed. Mar 15, 2017 1:15 PM - 6:15 PM 311 (311)

Kentaro Shinoda(AIST), Yoshinobu Nakamura(Univ. of Tokyo), Kyoko Namura(Kyoto Univ.)

△：Presentation by Applicant for JSAP Young Scientists Presentation Award
▲：English Presentation
▼：Both of Above
No Mark：None of Above

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1:15 PM - 1:30 PM

[15p-311-1] [JSAP Young Scientist Award Speech] Magnetic properties of iron cluster-containing amorphous silicate thin films

〇Yuko Nakatsuka¹, Kilian Pollok², Falko Langenhorst², Lothar Wondraczek², Shunsuke Murai¹, Koji Fujita¹, Katsuhisa Tanaka¹ (1.Kyoto Univ., 2.Univ. of Jena)

1:30 PM - 1:45 PM

△ [15p-311-2] Solid-phase epitaxial film growth of homologous phase Sr_nNb_nO_3n+2

〇(B)Yukio Nezu¹, Chunlin Chen², Yuichi Ikuhara³, Hiromichi Ohta⁴ (1.Hokkaido Univ., 2.AIMR-Tohoku Univ., 3.U. Tokyo, 4.RIES-Hokkaido Univ.)

1:45 PM - 2:00 PM

△ [15p-311-3] Epitaxial Mn₃GaN Thin Films Grown by Pulsed Laser Deposition

〇Ryo Miyamoto¹, Kouki Kanazawa¹, Ataru Ichinose², Takahiro Urata¹, Takahumi Hatano¹, Kazumasa Iida¹, Hiroshi Ikuta¹ (1.Nagoya Univ., 2.CRIEPI)

2:00 PM - 2:15 PM

△ [15p-311-4] Epitaxial growth of CaFe₂O₄ films on TiO₂ (100) surface

〇Nana Nishiyama¹, Hisanori Mashiko¹, Kohei Yoshimatsu¹, Koji Horiba², Hiroshi Kumigashira^2,3, Akira Ohtomo¹ (1.Tokyo Tech., 2.KEK-PF, 3.MCES.)

2:15 PM - 2:30 PM

△ [15p-311-5] Fabrication of V₂O₅-Bi₂O₃-WO₃glass thin film by pulsed laser deposition and optical and electrical characterization

〇Yuki Fujimoto¹, Shiori Takano¹, Satoru Kaneko², Akifumi Matsuda¹, Mamoru Yoshimoto¹ (1.Tokyo Tech., 2.Kanagawa Ind. Tech. Cent.)

2:45 PM - 3:00 PM

△ [15p-311-6] Fabrication of TiH₂ thin films using hydrogen-radical assisted pulsed-laser deposition

〇(B)Akito Nishi¹, Kohei Yoshimatsu¹, Akira Ohtomo^1,2 (1.Tokyo Tech., 2.MCES.)

3:00 PM - 3:15 PM

△ [15p-311-7] Epitaixial growth of niobium hydride using reactive magnetron sputtering

〇(B)Yuki Sasahara¹, Ryota Shimizu¹, Issei Sugiyama¹, Hiroyuki Oguchi², Susumu Shiraki², Shinichi Orimo^2,3, Taro Hitosugi^1,2 (1.Tokyo Tech, 2.Tohoku Univ. AIMR, 3.Tohoku Univ. IMR)

3:15 PM - 3:30 PM

△ [15p-311-8] Epitaxial growth of single-phase magnesium dihydride using reactive magnetron sputtering

〇(B)Takuya Kakinokizono¹, Ryota Shimizu¹, Issei Sugiyama¹, Hiroyuki Oguchi², Shin-ichi Orimo^2,3, Taro Hitosugi^1,2,4 (1.Tokyo Tech, 2.Tohoku Univ. AIMR, 3.Tohoku Univ. IMR, 4.JST-CREST)

3:30 PM - 3:45 PM

△ [15p-311-9] In Situ Temperature Measurement of Crystallization Process of Tin Oxide Films in ELAMOD Process at Nano Second Time Scale

〇Tsukasa Katsuki¹, Tetsuo Tsuchiya², Jun Akedo², Atsushi Yumoto¹, Kentaro Shinoda² (1.Shibaura Inst. Tech., 2.AIST)

3:45 PM - 4:00 PM

△ [15p-311-10] Influence of template patterns on the self-assembled nanostructures of oxide thin films toward oxide DSA

〇Geng Tan¹, MingYu Li¹, Osamu Nakagawara², Azusa Hattori¹, Hidekazu Tanaka¹ (1.ISIR, Osaka Univ., 2.Murata Manufacturing Co., Ltd.)

4:00 PM - 4:15 PM

△ [15p-311-11] Graphoepitaxial growth of In₂O₃ by quasi-VLS method on V-groove patterned substrates

〇Tokohei Go¹, Kohei Yoshimatsu¹, Akira Ohtomo^1,2 (1.Tokyo Tech., 2.MCES.)

4:30 PM - 4:45 PM

[15p-311-12] Low Refractive Index MgF₂ Optical Thin Films by Sputtering and Electron Beam Evaporation

〇Yoshiki Tsuno¹, Naoya Tajima², Hiroshi Murotani¹, Shigeharu Matsumoto³ (1.Sch. of Eng., Tokai Univ., 2.Grad. Sch. of Eng., Tokai Univ., 3.SHINCRON Co., Ltd.)

4:45 PM - 5:00 PM

[15p-311-13] Low Refractive Index SiO₂ Optical Thin Films Deposited by Sputtering and Electron Beam Evaporation

〇(B)Reika Ihara¹, Naoya Tajima², Hiroshi Murotani¹, Shigeharu Matsumoto³ (1.Sch. of Eng., Tokai Univ., 2.Grad. Sch. of Eng., Tokai Univ., 3.SHINCRON Co., Ltd.,)

5:00 PM - 5:15 PM

[15p-311-14] Growth of AlBN films deposited by CAPD and application to hard coating

〇Tomohiro Yoshida¹, Kouki Murasawa², Tsuyoshi Yoshitake³ (1.Fukuoka Industrial Technology Center, 2.OSG Corp., 3.Kyushu Univ.)

5:15 PM - 5:30 PM

[15p-311-15] Research of the deposition process by CeO₂ optical thin films (Ⅲ)

〇Saki Narita¹, Hiroshi Murotani¹, Tatsuji Amano², Shigeki Oka² (1.Grad. Sch. of Eng., Tokai Univ., 2.NIDEK CO., LTD.)

5:30 PM - 5:45 PM

[15p-311-16] Influence of Surface Roughness of Aluminum Alloy on Yttria Film by Chelate Flame Method

〇Takashi Costa¹, Atsushi Nakamura², Keiji Komatsu¹, Hidetoshi Saitoh¹ (1.Nagaoka Univ.Tech., 2.Chubu Chelest Co.,Ltd.)

5:45 PM - 6:00 PM

[15p-311-17] Crack analysis of LaSr₃Fe₃O_9.9 films deposited by chelate firing method

〇Yu Wang¹, Keiji Komatsu¹, Atsushi Nakamura^1,2, Hidetoshi Saitoh¹ (1.Nagaoka Univ. Tech., 2.Chubu Chelest Co., Ltd.)

6:00 PM - 6:15 PM

[15p-311-18] Deposition of Dense ZrO₂ Films by Chelate Flame Method

〇Yutaka Ikeda¹, Atsushi Nakamura^1,2, Keiji Komatsu¹, Hidetoshi Saitoh¹ (1.Nagaoka Univ. Tech., 2.Chubu Chelest Co., Ltd.)

Session information

[15p-311-1~18] 6.4 Thin films and New materials

[15p-311-1] [JSAP Young Scientist Award Speech] Magnetic properties of iron cluster-containing amorphous silicate thin films

△ [15p-311-2] Solid-phase epitaxial film growth of homologous phase Sr_nNb_nO_3n+2

△ [15p-311-3] Epitaxial Mn₃GaN Thin Films Grown by Pulsed Laser Deposition

△ [15p-311-4] Epitaxial growth of CaFe₂O₄ films on TiO₂ (100) surface

△ [15p-311-5] Fabrication of V₂O₅-Bi₂O₃-WO₃glass thin film by pulsed laser deposition and optical and electrical characterization

△ [15p-311-6] Fabrication of TiH₂ thin films using hydrogen-radical assisted pulsed-laser deposition

△ [15p-311-7] Epitaixial growth of niobium hydride using reactive magnetron sputtering

△ [15p-311-8] Epitaxial growth of single-phase magnesium dihydride using reactive magnetron sputtering

△ [15p-311-9] In Situ Temperature Measurement of Crystallization Process of Tin Oxide Films in ELAMOD Process at Nano Second Time Scale

△ [15p-311-10] Influence of template patterns on the self-assembled nanostructures of oxide thin films toward oxide DSA

△ [15p-311-11] Graphoepitaxial growth of In₂O₃ by quasi-VLS method on V-groove patterned substrates

[15p-311-12] Low Refractive Index MgF₂ Optical Thin Films by Sputtering and Electron Beam Evaporation

[15p-311-13] Low Refractive Index SiO₂ Optical Thin Films Deposited by Sputtering and Electron Beam Evaporation

[15p-311-14] Growth of AlBN films deposited by CAPD and application to hard coating

[15p-311-15] Research of the deposition process by CeO₂ optical thin films (Ⅲ)

[15p-311-16] Influence of Surface Roughness of Aluminum Alloy on Yttria Film by Chelate Flame Method

[15p-311-17] Crack analysis of LaSr₃Fe₃O_9.9 films deposited by chelate firing method

[15p-311-18] Deposition of Dense ZrO₂ Films by Chelate Flame Method

Authentication

Session information

[15p-311-1~18] 6.4 Thin films and New materials

△ [15p-311-2] Solid-phase epitaxial film growth of homologous phase SrnNbnO3n+2

△ [15p-311-3] Epitaxial Mn3GaN Thin Films Grown by Pulsed Laser Deposition

△ [15p-311-4] Epitaxial growth of CaFe2O4 films on TiO2 (100) surface

△ [15p-311-5] Fabrication of V2O5-Bi2O3-WO3 glass thin film by pulsed laser deposition and optical and electrical characterization

△ [15p-311-6] Fabrication of TiH2 thin films using hydrogen-radical assisted pulsed-laser deposition

△ [15p-311-7] Epitaixial growth of niobium hydride using reactive magnetron sputtering

△ [15p-311-8] Epitaxial growth of single-phase magnesium dihydride using reactive magnetron sputtering

△ [15p-311-9] In Situ Temperature Measurement of Crystallization Process of Tin Oxide Films in ELAMOD Process at Nano Second Time Scale

△ [15p-311-10] Influence of template patterns on the self-assembled nanostructures of oxide thin films toward oxide DSA

△ [15p-311-11] Graphoepitaxial growth of In2O3 by quasi-VLS method on V-groove patterned substrates

Authentication

△ [15p-311-2] Solid-phase epitaxial film growth of homologous phase Sr_nNb_nO_3n+2

△ [15p-311-3] Epitaxial Mn₃GaN Thin Films Grown by Pulsed Laser Deposition

△ [15p-311-4] Epitaxial growth of CaFe₂O₄ films on TiO₂ (100) surface

△ [15p-311-5] Fabrication of V₂O₅-Bi₂O₃-WO₃glass thin film by pulsed laser deposition and optical and electrical characterization

△ [15p-311-6] Fabrication of TiH₂ thin films using hydrogen-radical assisted pulsed-laser deposition

△ [15p-311-11] Graphoepitaxial growth of In₂O₃ by quasi-VLS method on V-groove patterned substrates