Evaluation of Heating Characteristics of High Power Atmospheric Pressure Thermal-Plasma-Jet and Control of Crystal Growth of Silicon Thin Films

Presentation information

Oral presentation

13 Semiconductors » 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

Tue. Mar 14, 2017 9:15 AM - 12:00 PM 304 (304)

Takashi Noguchi(Univ. of the Ryukyus), Seiichiro Higashi(Hiroshima Univ.), Taizoh Sadoh(Kyushu Univ.)

10:45 AM - 11:00 AM

〇Ryosuke Nakashima¹, Hiroaki Hanafusa¹, Seiichiro Higashi¹ (1.Hiroshima Univ.)

Keywords:Atmospheric pressure thermal plasma jet, Silicon thin films, Melting crystallization