[14p-419-1~16] 6.3 Oxide electronics

△ [14p-419-7] Reversible control of resistance of NdNiO₃ thin film through topotactic fluorination/oxygen annealing

〇(DC)Tomoya Onozuka¹, Akira Chikamatsu¹, Tsukasa Katayama¹, Yasushi Hirose^1,2, Isao Harayama³, Daiichiro Sekiba³, Eiji Ikenaga⁴, Makoto Minohara⁵, Hiroshi Kumigashira⁵, Tetsuya Hasegawa^1,2 (1.Univ. of Tokyo, 2.KAST, 3.UTTAC, 4.JASRI, 5.KEK-PF)

Keywords:pulsed laser deposition, oxyfluoride, topotactic reaction