[14p-423-1~14] CS.4 7. Code-sharing Session: Beam Technology and Nanofabrication

[14p-423-8] Local nanopatterning by self-assembly/electron beam combined lithography

〇Reo Kometani¹, Kei Nishikawa¹, Etsuo Maeda¹ (1.The Univ. of Tokyo)

Keywords:self-assembly, electron beam lithography, nanopatterning

In this study, a self-assembly/electron beam combined lithography has been researched in order to achieve the simple process for local nanopatterning. As a result, a positive-tone nanostructure and negative-tone nanostructure was demonstrated. Nanopatterning characteristics of a self-assembly/electron beam combined lithography will be reported in details.