[14p-423-1~14] CS.4 7. Code-sharing Session: Beam Technology and Nanofabrication

[14p-423-9] Investigation of 2-variable 2nd-order Approximation Model on Line-and-space Pattern Formed by Electron Beam Exposure System

〇Masahito Kurouchi¹, Manabu Yasui¹, Takeshi Ozawa¹ (1.Kanagawa Ind. Tech. Center)

Keywords:electron beam lithography, line and space, correction