[14p-P1-1~25] 8 Plasma Electronics（Poster）

[14p-P1-16] Atmospheric-Pressure Plasma-Deposition of Microporous Silica Membranes and Their Gas Permeation Properties

〇Hiroki Nagasawa¹, Yuta Yamamoto¹, Masakoto Kanezashi¹, Toshinori Tsuru¹ (1.Hiroshima Univ.)

Keywords:atmospheric-pressure plasma, microporous silica membrane, chemical vapor deposition

Microporous silica membranes with molecular sieving properties were fabricated at low temeprature by using an atmospheric-pressure plasma-enhanced chemical vapor deposition. The resultant membranes exhibited an excellent gas permeselectivity, which can be applied for the gas separation such as hydrogen and carbon dioxide. The effects of precursors and plasma working gases on the membrane structure were investigated in order to tailor the permeation properties of the membranes.