The 64th JSAP Spring Meeting, 2017

Presentation information

Oral presentation

8 Plasma Electronics » 8.2 Plasma measurements and diagnostics

[15a-301-1~7] 8.2 Plasma measurements and diagnostics

Wed. Mar 15, 2017 9:00 AM - 10:45 AM 301 (301)

Kenji Ishikawa(Nagoya Univ.)

10:00 AM - 10:15 AM

[15a-301-5] Two-dimensional estimation of Ti excitation temperature and Ti vapor admixture ratio in the torch during Ti feedstock injection into the Ar induction thermal plasmas

Naoto Kodama1, Yosuke Ishisaka1, Kotaro Shimizu1, Yasunori Tanaka1, Yoshihiko Uesugi1, Tatsuo Ishijima1, Shiori Sueyasu2, Shu Watanabe2, Ketaro Nakamura2 (1.Kanazawa Univ., 2.Nisshin Seifun Group Inc.)

Keywords:Thermal plasma, Optical emission spectroscopy

For metal material processing using induction thermal plasma (ICTP), admixture of metal vapor to the ICTP greatly changes plasma properties. Thus, estimation of spatial distribution of metal vapor admixture ratio is essential to investigate changing in plasma properties during processing. This report describes investigation results for spatial distribution of temperature and Ti vapor admixture ratio during Ti feedstock feeding into the Ar ICTP torch. Furthermore, spatial distribution of Ti atom and electron densities were also determined.