[15a-318-1~11] CS.4 7. Code-sharing Session: Beam Technology and Nanofabrication

[15a-318-4] Debris mitigation of laser driven extreme ultraviolet light (EUV) source for material processing

〇(M1C)Nao Wada¹, Nozomi Tanaka¹, Yasuyuki Kageyama², Ryo Deguchi¹, Akifumi Yogo¹, Hiroaki Nishimura¹ (1.ILE, Osaka Univ., 2.Toyota CRDL)

Keywords:extreme ultraviolet (EUV) light, light material processing, laser plasma debris mitigation

Recently, Extreme ultraviolet (EUV) light attracts much attention in practical application studies that make use of the high photon energy of intense EUV light. Although laser driven EUV sources associated with focusing mirrors enables us to use intense EUV radiation, mitigation of debris from the source or the mirrors would be a challenge, especially to a cleanness level of requirements for advanced material processing. In this study, we suggested two types of optical setups for EUV transport that also work as debris mitigation systems. Their optical characteristics and debris mitigation ability were validated.