2017年第64回応用物理学会春季学術講演会

講演情報

一般セッション(口頭講演)

13 半導体 » 13.6 Semiconductor English Session

[15a-513-1~8] 13.6 Semiconductor English Session

2017年3月15日(水) 09:00 〜 11:15 513 (513)

國本 崇(徳島文理大)、小山 正人(東芝)

10:00 〜 10:15

[15a-513-5] Breakdown Voltage Instability in nLDMOS Transistors

Chen Jone F1、Feng Ya-Sheng1 (1.National Cheng Kung Univ.)

キーワード:LDMOS transistor, breakdown voltage

Hot-carrier induced drain breakdown voltage instability in n-type lateral diffused metal-oxide-semiconductor (LDMOS) transistors is investigated. Based on charge pumping measurement data and technology computer-aided-design simulation results, hot-carrier induced interface states generated at the accumulation region is proposed to be the root cause of the breakdown voltage instability.