Micromachining using laser plasma EUV sources

Tetsuya Makimura; Hikari Urai; Daisuke Nakamura; Akihiko Takahashi; Hiroyuki Niino; Tatsuo Okada

Presentation information

Symposium (Oral)

Symposium » Variety of light sources and possibilities of their applications to novel light processing

[15p-418-1~12] Variety of light sources and possibilities of their applications to novel light processing

Wed. Mar 15, 2017 1:30 PM - 6:30 PM 418 (418)

Yoichiroh Hosokawa(NAIST), Masaaki Sakakura(Kyoto Univ.), Kenji Torizuka(AIST)

4:00 PM - 4:30 PM

[15p-418-7] Micromachining using laser plasma EUV sources

〇Tetsuya Makimura¹, Hikari Urai¹, Daisuke Nakamura³, Akihiko Takahashi³, Hiroyuki Niino⁴, Tatsuo Okada² (1.Univ. of Tsukuba, 2.Kyusyu Univ., 3.Kyushu Univ., 4.AIST)

Keywords:laser plasma EUV sources, PDMS, micromachining

We will review micromachining techniques using short-wavelength light. Then we will present our results using laser plasma extreme ultraviolet light. The EUV light has short wavelengths and high photon energy. We have investigated ablation process and have achieved precise micro- and nano-machining of SiO2, PMMA, PDMS.