[16a-E206-1~13] 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

[16a-E206-10] CMOSFET Fabrication by Minimal Spin-on Dopant Process using Plasma Enhanced CVD TEOS as Thermal diffusion mask(Ⅱ)

〇Kazuhiro Koga^1,2, Fumito Imura^1,2, Sommawan Khumpuang^1,2, Shiro Hara^1,2 (1.AIST, 2.MINIMAL)

Keywords:minimalfab