The 64th JSAP Spring Meeting, 2017

Presentation information

Symposium (Oral)

Symposium » Process technology for advanced power semiconductor devices

[16p-502-1~10] Process technology for advanced power semiconductor devices

Thu. Mar 16, 2017 1:45 PM - 6:30 PM 502 (502)

Mutsuko Hatano(Titech), Masahiro Ishida(Panasonic), Katsuhiko Nishiwaki(Toyota)

4:00 PM - 4:30 PM

[16p-502-6] Fabrication Process Technology for Vertical GaN Devices

Testu Kachi1 (1.Nagoya Univ. IMaSS)

Keywords:GaN device, process technology

Vertical GaN devices have been recognized as very low on-resistance power devices. High performance devices with over 1kV breakdown voltage have been reported, which resulted in attracting researcher's attention. However, many problems to be solved in the fabrication process technologies remain yet. In this presentation, current status of the development of the process technologies were reviewed.