[17a-315-1~15] 8.3 Plasma deposition of thin film and surface treatment

[17a-315-12] Properties of crystalline Ge films formed on polyimide substrate using sputtering assisted layer-exchange

〇Masaharu Shiratani¹, Sota Tanami¹, Daisuke Sakamoto¹, Hakutatsu Chou¹, Hyunwoong Seo¹, Daisuke Yamashita¹, Naho Itagaki¹, Kazunori Koga¹ (1.Kyushu Univ.)

Keywords:sputtering assisted layer-exchange, polyimide substrate, crystalline Ge film