Oral presentation

[17a-315-1~15] 8.3 Plasma deposition of thin film and surface treatment

Fri. Mar 17, 2017 9:00 AM - 1:00 PM 315 (315)

Akihisa Ogino(Shizuoka Univ.), Ryuta Ichiki(Oita Univ.)

△：Presentation by Applicant for JSAP Young Scientists Presentation Award
▲：English Presentation
▼：Both of Above
No Mark：None of Above

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9:00 AM - 9:15 AM

△ [17a-315-1] Effect of sheath on the nanodiamond synthesis on Si surfaces using the dc methane/hydrogen plasma

〇Tomoki Kobayashi¹, Kazuki Uchida¹, Yuto Nawata², Masamichi Naitoh¹, Tomonori Ikari³, Tatsuzo Nagai⁴, Fumiya Shoji⁴ (1.Grad. School of Life Sci. & Sys. Eng., Kyushu Inst.Tech., 2.Kyushu Inst.Tech., 3.National Inst. of Tech., Ube College, 4.KKU Res. Institute)

9:15 AM - 9:30 AM

△ [17a-315-2] Preparation of high index surfaces cubic boron nitride and diamond thin film growth

〇(DC)Takahiro Tamura¹, Takuya Takami¹, Takashi Yanase², Taro Nagahama², Toshihiro Shimada² (1.Hokkaido Univ., 2.Hokkaido Univ.)

9:30 AM - 9:45 AM

△ [17a-315-3] Formation of Diamond-Like-Carbon Film Using Pulsed Arc Jet

〇Itaru Fujita¹, Yuki Kondo¹, Toru Harigai¹, Yoshiyuki Suda¹, Hirofumi Takikawa¹, Hidenobu Gonda² (1.Toyohashi Univ. Technol., 2.OSG.Corp.)

9:45 AM - 10:00 AM

△ [17a-315-4] Characterization of Tungsten Carbide Thin Films Fabricated by Using Filtered Pulse Arc Deposition

〇Ryo Isono¹, Toru Harigai¹, Yushi Iijima¹, Yoshiyuki Suda¹, Hirofumi Takikawa¹ (1.Toyohashi Univ. Technol.)

10:00 AM - 10:15 AM

△ [17a-315-5] Investigation of Expanded Austenite Locally Formed by Atmospheric-Pressure Plasma

〇Akihide Maeda¹, Ryuta Ichiki¹, Ryo Tomizuka¹, Shuichi Akamine¹, Seiji Kanazawa¹ (1.Oita Univ.)

10:15 AM - 10:30 AM

△ [17a-315-6] Spectroscopic Investigations in Water Plasma Ashing Process for Polymer Films with Different Chemical Structures

〇(M1C)Hiroaki Suzuki¹, Takuya Kitano¹, Arufua Shiota¹, Tatsuo Ishijima¹, Yasunori Tanaka¹, Yoshihiko Uesugi¹, Takashi Nishiyama², Hideo Horibe² (1.Kanazawa Univ., 2.Osaka City Univ.)

10:30 AM - 10:45 AM

△ [17a-315-7] Relationship between density of atomic nitrogen and temperature of discharge tube in a remote nitrogen plasma source

〇masaharu shimabayashi¹, kazuaki kurihara², koichi sasaki¹ (1.Hokkaido Univ., 2.Toshiba/Imec)

11:00 AM - 11:15 AM

[17a-315-8] Composition dependence of ITO thin film fabricating by hybrid facing-target sputtering

〇Shinichi Morohashi^1,2, Tsukasa Tanimoto¹, Keisuke Tsujita¹ (1.Yamaguchi Univ., 2.AIST)

11:15 AM - 11:30 AM

[17a-315-9] Photoluminescence of (ZnO)_x(InN)_1-x films fabricated by RF magnetron sputtering

Koichi Matsushima¹, 〇Nanoka Miyahara¹, Kazuya Iwasaki¹, Daisuke Yamashita¹, Hyunwoong Seo¹, Kazunori Koga¹, Masaharu Shiratani¹, Naho Itagaki¹ (1.Kyushu Univ.)

11:30 AM - 11:45 AM

[17a-315-10] Formation of High-Mobility IGZO Thin Film Transistors with Plasma Enhanced Reactive Sputter Deposition

Yuichi Setsuhara¹, Masashi Endo¹, 〇Kosuke Takenaka¹, Giichiro Uchida¹, Akinori Ebe² (1.Osaka Univ., 2.EMD Corp.)

11:45 AM - 12:00 PM

[17a-315-11] Suppressing Si-H₂ bond formation at P/I interface of a-Si:H solar cells

〇Susumu Toko¹, Kazuma Tanaka¹, Takashi Kojima¹, Kimitaka Keya¹, Daisuke Yamashita¹, Hyunwoong Seo¹, Naho Itagaki¹, Kazunori Koga¹, Masaharu Shiratani¹ (1.Kyushu Univ.)

12:00 PM - 12:15 PM

[17a-315-12] Properties of crystalline Ge films formed on polyimide substrate using sputtering assisted layer-exchange

〇Masaharu Shiratani¹, Sota Tanami¹, Daisuke Sakamoto¹, Hakutatsu Chou¹, Hyunwoong Seo¹, Daisuke Yamashita¹, Naho Itagaki¹, Kazunori Koga¹ (1.Kyushu Univ.)

12:15 PM - 12:30 PM

[17a-315-13] Magnetic Field Effects on Charged Particle Dynamics in Arc Ion Plating Device

〇(M2)Masato Fukuda¹, Hideyuki Usui¹, Yohei Miyake¹, Kenji Yamamoto², Akira Narai², Masao Mizuno², Hiroaki Nii² (1.Kobe Univ., 2.Kobe Steel Ltd.)

12:30 PM - 12:45 PM

[17a-315-14] Modification of Yttrium Oxide Nanophosphors by Atmospheric Pressure Plasma

〇Kenta Sekiya¹, Kamimura Masao², Soga Kohei², Kitano Katsuhisa³ (1.Dept. Mater. Sci. & Tech., Tokyo Univ. of Sci., 2.IFC, Tokyo Univ. of Sci., 3.Eng. Osaka Univ.)

12:45 PM - 1:00 PM

[17a-315-15] DLC On-site Deposition by Atmospheric-Pressure Pen-like PlasmaⅡ

〇Hiroyuki Yoshiki¹, Kousuke Gando¹, Yuhei Suto¹ (1.Tsuruoka National College of Tech.)

Sessions

8 Plasma Electronics » 8.3 Plasma deposition of thin film and surface treatment