The 64th JSAP Spring Meeting, 2017

Presentation information

Oral presentation

8 Plasma Electronics » 8.3 Plasma deposition of thin film and surface treatment

[17a-315-1~15] 8.3 Plasma deposition of thin film and surface treatment

Fri. Mar 17, 2017 9:00 AM - 1:00 PM 315 (315)

Akihisa Ogino(Shizuoka Univ.), Ryuta Ichiki(Oita Univ.)

10:15 AM - 10:30 AM

[17a-315-6] Spectroscopic Investigations in Water Plasma Ashing Process for Polymer Films with Different Chemical Structures

〇(M1C)Hiroaki Suzuki1, Takuya Kitano1, Arufua Shiota1, Tatsuo Ishijima1, Yasunori Tanaka1, Yoshihiko Uesugi1, Takashi Nishiyama2, Hideo Horibe2 (1.Kanazawa Univ., 2.Osaka City Univ.)

Keywords:water plasma, resists removal, Ashing