[17a-315-1~15] 8.3 Plasma deposition of thin film and surface treatment

[17a-315-8] Composition dependence of ITO thin film fabricating by hybrid facing-target sputtering

〇Shinichi Morohashi^1,2, Tsukasa Tanimoto¹, Keisuke Tsujita¹ (1.Yamaguchi Univ., 2.AIST)

Keywords:hybrid facing-target sputtering, ITO thin films

By using hybrid facing-target sputtering, ITO thin films were fabricated in as-depo state on PET film substrate with two kinds of targets of different compositions. Resistivity, Hall effect measurement and transmittance measurement were carried out to obtain comparative study of these thin films.