Magnetic Field Effects on Charged Particle Dynamics in Arc Ion Plating Device

Presentation information

Oral presentation

8 Plasma Electronics » 8.3 Plasma deposition of thin film and surface treatment

Fri. Mar 17, 2017 9:00 AM - 1:00 PM 315 (315)

Akihisa Ogino(Shizuoka Univ.), Ryuta Ichiki(Oita Univ.)

12:15 PM - 12:30 PM

〇(M2)Masato Fukuda¹, Hideyuki Usui¹, Yohei Miyake¹, Kenji Yamamoto², Akira Narai², Masao Mizuno², Hiroaki Nii² (1.Kobe Univ., 2.Kobe Steel Ltd.)

Keywords:AIP Device, PIC simulation, Plasma Deposition