Yusuke Ito

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Speaker, Author, Co-Author

Wed. Sep 19, 2018 9:15 AM - 11:45 AM 234B (234-2)

Oral presentation
| 6 Thin Films and Surfaces
| 6.4 Thin films and New materials

[19a-234B-1~9] 6.4 Thin films and New materials

11:15 AM - 11:30 AM

[19a-234B-8] High-rate sputter deposition of tantalum oxide thin films using water vapor as a reactive gas

〇Yusuke Ito¹, Yoshio Abe¹, Midori Kawamura¹, Kyung Ho Kim¹, Takayuki Kiba¹ (1.Kitami Inst. Tech.)