KENJI NOMURA

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Speaker, Author, Co-Author

Wed. Sep 19, 2018 1:45 PM - 7:00 PM 133 (133+134)

Oral presentation
| 6 Thin Films and Surfaces
| 6.1 Ferroelectric thin films

[19p-133-1~19] 6.1 Ferroelectric thin films

4:15 PM - 4:30 PM

[19p-133-10] Improvement of polarization characteristics by optimizing heat treatment condition and IrO_x oxidation state, and crystallization mechanism analysis in IrO_x / PLZT / Pt

〇KENJI NOMURA¹, Wensheng Wang², Hideshi Yamaguchi¹, Ko Nakamura², Takashi Eshita^2,3, Soichiro Ozawa², Kazuaki Takai², Satoru Mihara², Yukinobu Hikosaka², Makoto Hamada², Manabu Kojima², Yuji Kataoka¹ (1.Fujitsu Lab., 2.Fujitsu Semiconductor Ltd., 3.Wakayama Univ.)