Tatsuhiro Ogawa

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Speaker, Author, Co-Author

Thu. Sep 20, 2018 9:30 AM - 11:45 AM 233 (233)

Oral presentation
| 13 Semiconductors
| 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

[20a-233-1~9] 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

9:45 AM - 10:00 AM

[20a-233-2] Analyses of As doped in Si activated and deactivated by flash lamp annealing and post annealing using soft X-ray photoelectron spectroscopy

〇(M2)Tatsuhiro Ogawa¹, Kotaro Natori¹, Takuya Hoshii¹, Masashi Nakatake², Yoshio Watanabe², Tutomu Nagayama³, Takahiro Higuchi³, Shinichi Kato⁴, Hideaki Tanimura⁴, Kuniyuki Kakushima¹, Hitoshi Wakabayashi¹, Kazuo Tsutsui¹ (1.Tokyo Tech, 2.Aichi SR, 3.Nissin Ion, 4.SCREEN)

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