Kousi Nisiyama

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Speaker, Author, Co-Author

Thu. Sep 20, 2018 9:00 AM - 12:00 PM 234A (234-1)

Oral presentation
| 21 Joint Session K
| 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

[20a-234A-1~11] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

9:45 AM - 10:00 AM

[20a-234A-4] Growth and characterization of AlTiO insulating films by mist CVD method

〇Kousi Nisiyama¹, Kazuki Nisimura¹, Takaaki Tsuda¹, Qiang Yin², Zenji Yatabe³, Kouji Sue², Yusui Nakamura^4,5 (1.GSST, Kumamoto Univ., 2.Fac. of Eng. Kumamoto Univ., 3.POIE Kumamoto Univ., 4.FAST, Kumamoto Univ., 5.Phoenics)

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