[20a-234A-1~11] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

[20a-234A-4] Growth and characterization of AlTiO insulating films by mist CVD method

〇Kousi Nisiyama¹, Kazuki Nisimura¹, Takaaki Tsuda¹, Qiang Yin², Zenji Yatabe³, Kouji Sue², Yusui Nakamura^4,5 (1.GSST, Kumamoto Univ., 2.Fac. of Eng. Kumamoto Univ., 3.POIE Kumamoto Univ., 4.FAST, Kumamoto Univ., 5.Phoenics)

Keywords:mist CVD, AlTiO, insulator