Charisse Cagomoc

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Speaker, Author, Co-Author

Thu. Sep 20, 2018 1:45 PM - 7:15 PM 438 (3F_Lounge)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[20p-438-1~21] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

4:15 PM - 4:30 PM

▼ [20p-438-11] Molecular dynamics simulation of hole etching in SiO₂by energetic fluorocarbon ion injection

〇(M1)Charisse Cagomoc¹, Michiro Isobe¹, Kazuhiro Karahashi¹, Takuya Hirohashi², Junichi Hashimoto², Mitsuhiro Omura², Hisataka Hayashi², Satoshi Hamaguchi¹ (1.Osaka University, 2.Toshiba Memory Corp.)