Abdulrahman Hikmat Basher

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Speaker, Author, Co-Author

Thu. Sep 20, 2018 1:45 PM - 7:15 PM 438 (3F_Lounge)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[20p-438-1~21] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

2:15 PM - 2:30 PM

▲ [20p-438-3] Atomic-layer etching (ALE) of magnetic films by Hexafluoroacetylacetone (HFAC) molecules

〇(D)Abdulrahman Hikmat Basher¹, Michiro Isobe¹, Tomoko Ito¹, Masato Kiuchi², Take Takeuchi³, Kazuhiro Karahashi¹, Ikutaro Hamada¹, Yoshitada Morikawa¹, Satoshi Hamaguchi¹ (1.Osaka Univ., 2.AIST, 3.Nara Womens Univ.)

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