Takahiro Omichi

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Speaker, Author, Co-Author

Thu. Sep 20, 2018 1:45 PM - 7:15 PM 438 (3F_Lounge)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[20p-438-1~21] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

2:45 PM - 3:00 PM

△ [20p-438-5] Effects to addition of H₂into Cl₂plasma at high temperature for etching of GaN

〇(M1)Takahiro Omichi¹, Tanide Atsushi^1,2, Ishikawa Kenji¹, Tsutsumi Takayoshi¹, Kondo Hiroki¹, Sekine Makoto¹, Hori Masaru¹ (1.Nagoya Univ., 2.SCREEN Holdings Co., Ltd.)