Shota Ishikawa

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Speaker, Author, Co-Author

Thu. Sep 20, 2018 1:45 PM - 7:15 PM 438 (3F_Lounge)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[20p-438-1~21] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

3:00 PM - 3:15 PM

△ [20p-438-6] Photoresist Removal Treatment Using Atmospheric-Pressure Microwave O₂/CF₄ Plasma

〇Shota Ishikawa¹, Haruka Suzuki¹, Tsuyoshi Honda², Hirotaka Toyoda¹ (1.Nagoya Univ., 2.Nissin)