Kenta Irikura

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Speaker, Author, Co-Author

Fri. Sep 21, 2018 9:00 AM - 12:00 PM 233 (233)

Oral presentation
| 13 Semiconductors
| 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

[21a-233-1~12] 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

11:30 AM - 11:45 AM

[21a-233-11] Effect of SiHCl₃ gas concentration on transport phenomena in Minimal Silicon CVD Reactor

〇(M1)Kenta Irikura¹, Hitoshi Habuka¹ (1.Yokohama Nat. Univ.)