Shinnosuke Honda

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Speaker, Author, Co-Author

Fri. Sep 21, 2018 1:30 PM - 3:30 PM PB (Shirotori Hall)

Poster presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[21p-PB1-1~18] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

1:30 PM - 3:30 PM

[21p-PB1-15] Ashing characteristics of polyimide by radio frequency hollow cathode discharge plasma using Ar/O₂ mixed gas

〇(M1)Shinnosuke Honda¹, Yasunori Ohtsu¹ (1.Saga Univ.)