1:30 PM - 3:30 PM
[21p-PB1-15] Ashing characteristics of polyimide by radio frequency hollow cathode discharge plasma using Ar/O2 mixed gas
Keywords:plasma, Ashing
Presentation information
Poster presentation
8 Plasma Electronics » 8.2 Plasma deposition of thin film, plasma etching and surface treatment
[21p-PB1-1~18] 8.2 Plasma deposition of thin film, plasma etching and surface treatment
Fri. Sep 21, 2018 1:30 PM - 3:30 PM PB (Shirotori Hall)