The 79th JSAP Autumn Meeting, 2018

Presentation information

Oral presentation

6 Thin Films and Surfaces » 6.3 Oxide electronics

[18a-223-1~9] 6.3 Oxide electronics

Tue. Sep 18, 2018 9:15 AM - 11:45 AM 223 (223)

Ryota Shimizu(Tokyo Tech)

11:15 AM - 11:30 AM

[18a-223-8] Electrochemical reaction of NdNiO3 thin films with NaCl solution

Ryosuke Ishigami1, Akira Chikamatsu1, Tsukasa Katayama1, Miho Kitamura2, Koji Horiba2, Hiroshi Kumigashira2,3, Tetsuya Hasegawa1 (1.Univ. of Tokyo, 2.KEK, 3.Tohoku Univ.)

Keywords:NdNiO3, thin film, electrochemical reaction

Electrochemical reaction of NdNiO3 thin films using NaCl aqueous solution was conducted. X-ray diffraction and Secondary ion mass spectrometry indicate that the insertion / deinsertion of hydrogen occured in the thin film by electrochemical reaction and the c-axis length expanded / contracted. X-ray absorption spectroscopy also shows that the valence states of Ni changed from Ni3+ to Ni2+ with hydrogen insertion. This indicates that hydogen was doped as H+ and valence states of Ni was reduced. In the lecture, we will also discuss the changes in physical properties.