The 79th JSAP Autumn Meeting, 2018

Presentation information

Oral presentation

6 Thin Films and Surfaces » 6.1 Ferroelectric thin films

[19p-133-1~19] 6.1 Ferroelectric thin films

Wed. Sep 19, 2018 1:45 PM - 7:00 PM 133 (133+134)

Tomoaki Yamada(Nagoya Univ.), Takeshi Yoshimura(Osaka Pref. Univ.), Takashi Eshita(Wakayama Univ.), Hiroshi Naganuma(Tohoku Univ.)

3:00 PM - 3:15 PM

[19p-133-6] In-situ observation of crystallographic deformation of (K,Na)NbO3 lead-free thin films under voltage application

Geng Tan1, Shintaro Nishioka1, Tomoyuki Koganezawa2, Toshihito Umegaki1, Isaku Kanno1 (1.Kobe Univ., 2.JASRI)

Keywords:In-situ XRD measurement, Lead-free piezoelectric thin films

(K,Na)NbO3 (KNN) lead-free thin films have been receiving much attention owing to their relatively high piezoelectric properties comparable to PZT thin films. KNN thin films are expected to be suitable alternatives to PZT thin films. In order to improve the piezoelectric properties of KNN thin films, it is essential to understand the crystallographic deformation under application of voltages. In this study, we investigated the synchrotron X-ray diffraction (XRD) of KNN thin films in the both in-plane and out of plane directions under applied DC voltages. We also compared the result with that of PZT thin films.