The 79th JSAP Autumn Meeting, 2018

Presentation information

Oral presentation

21 Joint Session K » 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

[19p-224A-1~8] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

Wed. Sep 19, 2018 1:00 PM - 3:15 PM 224A (224-1)

Keisuke Ide(Tokyo Tech.), Shizuo Fujita(京大)

2:00 PM - 2:15 PM

[19p-224A-4] Hump Phenomena of a-IGZO TFT with Top Gate Structure

Yuya Kuwahara1, Kazushige Takechi1, Jun Tanaka1 (1.Tianma Japan)

Keywords:oxide semiconductor, IGZO, instability

We studied dependence on TFT's shape regarding hump phenomena of a top gate a-IGZO TFT with positive gate-bias stress voltage. After stress, we confirmed that a ring TFT did not have any hump while a rectangle TFT had the hump. This results support a model that hump phenomena are derived from parasitic TFTs at the TFT's edge region in the W direction.