The 79th JSAP Autumn Meeting, 2018

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7 Beam Technology and Nanofabrication » 7.3 Micro/Nano patterning and fabrication

[19p-234A-1~10] 7.3 Micro/Nano patterning and fabrication

Wed. Sep 19, 2018 1:30 PM - 4:15 PM 234A (234-1)

Jiro Yamamoto(HITACHI), Jun Taniguchi(Tokyo Univ. of Sci.), Hiroaki Kawata(Osaka Pref. Univ.)

3:15 PM - 3:30 PM

[19p-234A-7] UV nanoimprint by water soluble polymer pattern as intermediate mold

〇Hiroaki Kawata1, Shingo Shimizu1, Masaaki Yasuda1, Yoshihiko Hirai1 (1.Osaka Pref. Univ.)

Keywords:UV nanoimprint, water soluble polymer

UV nanoimprint process by use of water soluble polymer pattern as intermediate mold is developed. Even when the water soluble resin is stuck to the original mold, the residual resin can be easily removed in water. Moreover, since the intermediate mold can be dissolved in water, no demolding process is necessary in the UV nanoimprint process.