Oral presentation

[19p-234A-1~10] 7.3 Micro/Nano patterning and fabrication

Wed. Sep 19, 2018 1:30 PM - 4:15 PM 234A (234-1)

Jiro Yamamoto(HITACHI), Jun Taniguchi(Tokyo Univ. of Sci.), Hiroaki Kawata(Osaka Pref. Univ.)

△：Presentation by Applicant for JSAP Young Scientists Presentation Award
▲：English Presentation
▼：Both of Above
No Mark：None of Above

+Add all to schedule

1:30 PM - 1:45 PM

[19p-234A-1] [Young Scientist Presentation Award Speech] Femtosecond laser induced periodic nanostructures on polymer surface for control of cell spreading

〇Keisuke Takenaka¹, Masahiro Tsukamoto², Yuji Sato², Kensuke Murai³, Satoru Asai¹ (1.Grad. Sch. of Eng., Osaka Univ., 2.JWRI, Osaka Univ., 3.AIST)

1:45 PM - 2:00 PM

[19p-234A-2] Penetration of Alternately Shifted and Densely Arrayed Multi-Slits through Walls of Stainless-Steel Pipes with a Diameter of 100 μm

〇Toshiyuki Horiuchi¹, Hiroshi Takahashi¹, Hiroshi Kobayashi¹, Akira Yanagida¹ (1.Tokyo Denki Univ.)

2:00 PM - 2:15 PM

[19p-234A-3] Realization of polyimide / Al junction using sputtering effects of Ar fast atom beam

〇(M2)Hideyuki Akazawa¹, Liang Jianbo¹, Matsubara Moeko², Dhamrin Marwan², Nishio Yoshitaka², Shigekawa Naoteru¹ (1.Osaka City Univ., 2.Toyo Aluminium K.K.)

2:15 PM - 2:30 PM

[19p-234A-4] Radiation-Induced Primary Process of Model Molecules of Fluorinated EUV Resist

〇Kazumasa Okamoto¹, Hiroki Yamamoto², Kazuo Kobayashi¹, Takahiro Kozawa¹ (1.Osaka Univ., 2.QST)

2:30 PM - 2:45 PM

[19p-234A-5] Estimation of Resist Bottom Widths for Reverse-tapered Resist Patterns using Top-view SEM Observation with High Acceleration Voltage

〇Masahito Kurouchi¹, Manabu Yasui¹, Satoru Kaneko¹ (1.KISTEC)

3:00 PM - 3:15 PM

[19p-234A-6] Fabrication of through hole electrodes for flexible devices

〇(M1)Kazuki Honjo¹, Taniguchi Jun¹ (1.TUS)

3:15 PM - 3:30 PM

[19p-234A-7] UV nanoimprint by water soluble polymer pattern as intermediate mold

〇Hiroaki Kawata¹, Shingo Shimizu¹, Masaaki Yasuda¹, Yoshihiko Hirai¹ (1.Osaka Pref. Univ.)

3:30 PM - 3:45 PM

[19p-234A-8] Durability of replica mold with anti-reflection-structure made by high-hardness release-agent-free UV curable resin

〇(M1)Junya Kawauchi¹, Jun Taniguchi¹, Shin Hiwasa² (1.TUS, 2.AUTEX)

3:45 PM - 4:00 PM

△ [19p-234A-9] Preparation of oxide thin film on periodic nanostructured polymer substrates

〇Ken Iwasa¹, Tomoaki Oga¹, Nobuo Tsuchimine², Satoru Kaneko^3,1, Akifumi Matsuda¹, Mamoru Yoshimoto¹ (1.Tokyo Tech., 2.TOSHIMA Manu., 3.KISTECH)

4:00 PM - 4:15 PM

[19p-234A-10] Fabrication of antireflection structures on the micro lens array

〇(M1)Masato Nakamura¹, Jun Taniguchi¹ (1.TUS)

Sessions

7 Beam Technology and Nanofabrication » 7.3 Micro/Nano patterning and fabrication