2:30 PM - 2:45 PM
[19p-234A-5] Estimation of Resist Bottom Widths for Reverse-tapered Resist Patterns using Top-view SEM Observation with High Acceleration Voltage
Keywords:Electron-beam lithography, Lift-off
Presentation information
Oral presentation
7 Beam Technology and Nanofabrication » 7.3 Micro/Nano patterning and fabrication
[19p-234A-1~10] 7.3 Micro/Nano patterning and fabrication
Wed. Sep 19, 2018 1:30 PM - 4:15 PM 234A (234-1)
Jiro Yamamoto(HITACHI), Jun Taniguchi(Tokyo Univ. of Sci.), Hiroaki Kawata(Osaka Pref. Univ.)