[19p-PB5-1~14] 13.9 Compound solar cells

[19p-PB5-1] Fabrication and evaluation of Ag₈SnS₆ photoelectrode by fine particle coating technique

〇(M1)GIAPHUC LENGUYEN¹, Kunihiko Tanaka¹ (1.Nagaoka Univ. of Tech.)

Keywords:Ag8SnS6, fine particle coating technique, photoelectrode

Currently, various semiconductor photocatalysts are being studied to prepare photoelectrodes. However, due to its wide energy band gap, many of them are not effective against visible light. Among them, Ag₈SnS₆ have a band gap of about 1.1 - 1.6 eV that can effectively utilize visible light. Sputtering method and chemical solution deposition method have been reported as a method of growing Ag₈SnS₆. Still, the sputtering method is expensive, while the chemical solution deposition method is inexpensive, but the quality of its product isn't so good. In this study, Ag₈SnS₆ thin film are grown by fine particle coating method which can be cheaper than sputtering method and can deposit more high quality thin films than chemical solution deposition method.