[20a-437-1~11] 8.3 Plasma nanotechnology

△ [20a-437-9] Organic high aspect pattern formation with 10 nm line width by controlled plasma process

〇Yusuke Fukunaga¹, Takayoshi Tsutsumi¹, Kenji Ishikawa¹, Hiroki Kondo¹, Makoto Sekine¹, Masaru Hori² (1.Nagoya Univ., 2.Nagoya Univ. Inst. Innovation for Future Society)

Keywords:substrate temperateure, organic material etching