[20a-438-1~12] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[20a-438-11] Effects of deposition precursors on Si network orderliness

〇Kazunori Koga¹, Kazuma Tanaka¹, Hisayuki Hara¹, Liu Shi¹, Shinya Nakano¹, Daisuke Yamashita¹, Kunihiro Kamataki¹, Naho Itagaki¹, Masaharu Shiratani¹ (1.Kyushu Univ.)

Keywords:Plasma CVD, Si bond configulation