[20a-438-1~12] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[20a-438-7] The Effect of Sub. Temperature and H₂ Addition on DLC Films Deposited by an APμPlasma

〇Hiroyuki Yoshiki¹, Junki Sato¹, Kousuke Gando^1,2 (1.Tsuruoka NCT, 2.Canon Inc.)

Keywords:atmospheric-pressure microplasma, DLC films, Plasma CVD

A pen-like plasma source (Plasma pen) has been proposed to achieve the on-site DLC coating at atmospheric pressure. DLC films were synthesized by plasma CVD using a CH₄/H₂/He gas mixtures. It was found that the hardness of the film significantly depends on the distance d, H₂ ratio and T_sub. The indentation hardness of a film surface H_IT of more than 17 GPa was obtained at a condition of d=1mm, H₂ concentration of 38% and T_sub. of 300℃. Raman spectroscopic analysis showed that G-band peak position is shifted to the higher wavenumber and the background fluorescence decreases with increasing T_sub and H₂ concentration.