Nitriding treatment by Active Screen Plasma and its evaluation ２

Susumu Ichimura; Seigo Takashima; Ippei Tsuru; Daichi Ohkubo; Hideaki Matsuo; Mineo Goto

Presentation information

Oral presentation

8 Plasma Electronics » 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[20p-438-1~21] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

Thu. Sep 20, 2018 1:45 PM - 7:15 PM 438 (3F_Lounge)

Kenji Ishikawa(Nagoya Univ.), Mitsuhiro Omura(Toshiba Memory)

6:00 PM - 6:15 PM

[20p-438-17] Nitriding treatment by Active Screen Plasma and its evaluation ２

〇(PC)Susumu Ichimura¹, Seigo Takashima¹, Ippei Tsuru², Daichi Ohkubo², Hideaki Matsuo², Mineo Goto² (1.Nagoya Industries Promotion Corporation, 2.NAKANIHON-RO KOGYO CO., LTD.)

Keywords:Nitriding treatment, Active Screen Plasma

Active screen plasma nitridation has been studied by Shimane Prefecture Industrial Technology Center Asahina, etc., Kansai University Nishimoto et al. On the other hand, we attempted to nitridize one SKD 61 10 mm sq. 5 mm t and nitrided. This time, we are conscious of mass production and verified the mass treatment method, so report it.