The 79th JSAP Autumn Meeting, 2018

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Oral presentation

8 Plasma Electronics » 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[20p-438-1~21] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

Thu. Sep 20, 2018 1:45 PM - 7:15 PM 438 (3F_Lounge)

Kenji Ishikawa(Nagoya Univ.), Mitsuhiro Omura(Toshiba Memory)

5:45 PM - 6:00 PM

[20p-438-16] Mechanism of fluorine-enhanced diffusion in III-V semiconductor compounds

〇Yoshifumi Zaizen1, Fukasawa Masanaga1, Minari Hideki1 (1.Sony Semiconductor Solutions Coporation)

Keywords:III-V semiconductor compounds