The 79th JSAP Autumn Meeting, 2018

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Oral presentation

8 Plasma Electronics » 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[20p-438-1~21] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

Thu. Sep 20, 2018 1:45 PM - 7:15 PM 438 (3F_Lounge)

Kenji Ishikawa(Nagoya Univ.), Mitsuhiro Omura(Toshiba Memory)

6:15 PM - 6:30 PM

[20p-438-18] Effect of H2-N2 plasma treatment on surface properties of titanium alloy

〇Koki Niimura1, Zhongqiu Lin1, Toshiaki Suzuki1,2, Masaaki Niwa1, Mitsuya Motohashi1 (1.Tokyo Denki Univ., 2.JEOL)

Keywords:Plasma, Surface treatment, Titanium