The 79th JSAP Autumn Meeting, 2018

Presentation information

Poster presentation

8 Plasma Electronics » 8.1 Plasma production and diagnostics

[20p-PA5-1~11] 8.1 Plasma production and diagnostics

Thu. Sep 20, 2018 4:00 PM - 6:00 PM PA (Event Hall)

4:00 PM - 6:00 PM

[20p-PA5-10] Macro-pulse design and optical emission spectroscopy for plasma generated by high-power pulsed magnetron sputtering using modulated pulsed power system

〇(B)Yuki Nakagomi1, Hiroshi Nishida1, Yoshihiro Hirai1, Nobuo Nishimiya1, Masaomi Sanekata1, Hiroaki Yamamoto2, Masahide Tona2, Keizo Tsukamoto2, Keijiro Ohshimo3, Fuminori Misaizu3 (1.Tokyo Polytechnic Univ., 2.Ayabo Corp, 3.Tohoku Univ.)

Keywords:magnetron sputtering, plasma diagnostics, optical measurement

Recently high power pulsed magnetron sputtering (HPPMS) which generate high energy particles and multiple charged ions has attracted a lot of attention and is studied and developed for a new hard coating technology on cutting tools. The optical emission spectroscopy for plasma generated by high power pulsed magnetron sputtering using modulated pulsed powers (MPP) designed with micro pulses will be discussed in this presentation.