The 79th JSAP Autumn Meeting, 2018

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Oral presentation

13 Semiconductors » 13.3 Insulator technology

[21a-145-1~9] 13.3 Insulator technology

Fri. Sep 21, 2018 9:00 AM - 11:30 AM 145 (Reception Hall)

Osamu Nakatsuka(Nagoya Univ.), Ishizaki Hiroki(Saitama Inst. of Tech.)

10:45 AM - 11:00 AM

[21a-145-7] Impact of ramp-up/down rate in RTA on HfO2 ferroelectricity

〇Yuki Mori1, Tomonori Nishimura1, Takeaki Yajima1, Shinji Migita2, Akira Toriumi1 (1.Univ. of Tokyo, 2.AIST)

Keywords:HfO2