The 79th JSAP Autumn Meeting, 2018

Presentation information

Print

Oral presentation

13 Semiconductors » 13.3 Insulator technology

[21a-145-1~9] 13.3 Insulator technology

Fri. Sep 21, 2018 9:00 AM - 11:30 AM 145 (Reception Hall)

Osamu Nakatsuka(Nagoya Univ.), Ishizaki Hiroki(Saitama Inst. of Tech.)

11:15 AM - 11:30 AM

[21a-145-9] Investigation of forming-free resistive switching properties in Al/HfO2/Si structure

〇Kohei Kobayashi1, Haruhiko Yoshida1, Koji Arafune1, Shin-ichi Satoh1, Yasushi Hotta1 (1.Univ. of Hyogo)

Keywords:resistive random access memory, HfO2, MIS structure